eSL10
E-beam patterned-wafer defect inspection system that finds defects other inspectors miss, using KLA's SMARTs deep-learning algorithms to separate defects of interest inline at leading logic and memory fabs.
What it does
- Semiconductor manufacturing equipment
- Industrial automation
- Data analysis
- Visual inspection
Features 6
- High ResolutionHigh beam current operation achieves high resolution e-beam imaging at high speed to identify critical gap defects.
- Wide Operating RangeElectron optics operate across a wide range of beam currents, supporting 3D NAND, DRAM and logic manufacturing.
- High Beam Current DensityElectron optics deliver high beam current density at a small spot size for high-sensitivity inspection.
- Yellowstone scanning modeProduces 10 billion pixels per scan at high speed and resolution over a large field of view.
- Simul-6 sensor technologyCollects secondary and back scattered electrons in one scan to gather surface, topographic and material contrast information.
- SMARTs deep learningIntegrated AI with deep learning algorithms that discriminate subtle defect signals from pattern and process noise.
Sources
- Pricing
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No published price; contact form only (standard s4.1 row 3), as for the sibling Voyager 1035.
- Description
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Official documentation · 10 Oct 2026
"captures and identifies defects not found by other inspectors"; Artificial Intelligence tab: "the first defect inspection system with integrated Artificial Intelligence, the eSL10 employs SMARTs deep learning algorithms".
- Sold within
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Product page offers only "Contact Us"; no route or packaging is stated (standard s4).
- Name
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Official documentation · 10 Oct 2026
"The eSL10 e-beam patterned wafer defect inspection system".
- URL
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Official documentation · 10 Oct 2026
KLA's own product page, title "eSL10 e-Beam Defect Inspection | Chip Manufacturing | KLA"; read in a browser 2026-10-10 (KLA blocks WebFetch).
- Deployment
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Official documentation · 10 Oct 2026
A fab inspection tool installed on the customer's line.
Also from KLA
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Voyager 1035 Hardware
Laser-scanning patterned-wafer inspection system for advanced logic and memory fabs, built around DefectWise, a deep-learning algorithm that separates defects of interest from pattern noise and nuisance defects inline to speed up process-excursion diagnosis.
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